| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a laminate obtained by laminating a layer to be etched having high smoothness and a thermal reaction type resist material on a substrate, the surface of which has a curved surface shape or a concave-convex shape. <P>SOLUTION: A laminate is obtained by laminating a dry etching layer, which is used for dry etching process using a chlorofluorocarbon-based gas and contains at least one element selected from the group consisting of Ta, Mo and Nb and a dry etching material selected from either one of its oxide, nitride, sulfide, carbide, selenide and silicide, and a thermal reaction type resist material on a substrate having a curved surface shape or a concave-convex shape. <P>COPYRIGHT: (C)2012,JPO&INPIT |
