| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a lithography original which can contribute to improvement in yield. <P>SOLUTION: In a manufacturing method of a lithography original, a continuous pattern of periodic patterns 4 which appear on a circuit pattern 3 is formed over the substantially whole area of a substrate, and defect inspection is performed to detect defects in the continuous pattern. The arrangement of a formation area of the circuit pattern is determined avoiding a detected defect to remove a continuous pattern formed outside the formation area of the circuit pattern. <P>COPYRIGHT: (C)2012,JPO&INPIT |
