发明名称 ALKYLSILANE LAMINATE, PRODUCTION METHOD THEREOF AND THIN-FILM TRANSISTOR
摘要 Provided is an alkylsilane laminate with which it is possible to obtain an organic semiconductor film having excellent semiconductor properties. Such a laminate can be useful for an organic thin-film transistor. The alkylsilane laminate comprises an underlayer (Sub) having hydroxyl groups at the surface and an alkylsilane thin film (AS) formed on this underlayer. The alkylsilane laminate is a laminate wherein the critical surface energy Ec of the alkylsilane thin film and the number of carbons (X) of the alkylsilane satisfies the following formula (1): Ec≦̸29.00−0.63x (mN/m) (1) Also provided is a thin-film transistor (10) having such an alkylsilane laminate (Sub, AS).
申请公布号 US2012080679(A1) 申请公布日期 2012.04.05
申请号 US201013322830 申请日期 2010.05.27
申请人 KUSHIDA TAKASHI;NAITO HIROYOSHI;TEIJIN LIMITED 发明人 KUSHIDA TAKASHI;NAITO HIROYOSHI
分类号 H01L29/786;B05D5/00;B32B9/04 主分类号 H01L29/786
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