| 摘要 |
Manufacturing a transparent component with invisible electrodes comprises depositing a conductive pattern of a transparent conductive oxide (TCO) film including electrodes, conductive paths and contact zones over the entire surface of a transparent substrate; depositing a first transparent dielectric layer having a low refractive index; and depositing a second transparent dielectric layer having a high refractive index. - Manufacturing a transparent component with invisible electrodes formed by a transparent substrate (2) comprises depositing over the entire surface of the substrate a transparent conductive oxide film, removing the zones of TCO that do not form the conductive pattern by etching and then removing the residual parts of the mask; depositing a first layer of a transparent dielectric material having a low refractive index (L); and depositing a second layer of another transparent dielectric material having a high refractive index (H) relative to that of the first layer. The transparent substrate has one face provided with the conductive pattern formed by electrodes, conductive paths (4) and contact zones (6).
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