| 摘要 |
<P>PROBLEM TO BE SOLVED: To solve the following problem: a conventional resist composition containing an acid generator cannot always satisfy the line edge roughness (LER) of an obtained pattern. <P>SOLUTION: There is provided a salt represented by formula (I) wherein: Q<SP POS="POST">1</SP>and Q<SP POS="POST">2</SP>each independently denote a fluorine atom or a 1-6C perfluoroalkyl group; L<SP POS="POST">1</SP>denotes a divalent 1-17C saturated hydrocarbon group, and a methylene group constituting the saturated hydrocarbon group may be replaced with an oxygen atom or a carbonyl group; a ring W denotes a 4-36C aliphatic ring, and a methylene group constituting the aliphatic ring may be replaced with an oxygen atom, a sulfur atom, a carbonyl group or a sulfonyl group; A<SP POS="POST">1</SP>denotes a methylene group or an ethylene group; R<SP POS="POST">1</SP>denotes a 1-12C hydrocarbon group or a 2-12C acyl group; and Z<SP POS="POST">+</SP>denotes an organic cation. <P>COPYRIGHT: (C)2012,JPO&INPIT |
