| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mask defect inspection device and a mask defect inspection method using the device, allowing efficient inspection even when a mask has a level difference between a pattern region and a non-pattern region on its surface. <P>SOLUTION: The mask defect inspection device and the mask defect inspection method using the device include a focus adjustment mechanism for adjusting focus to the mask surface, a first and a second focus detection parts for detecting focuses respectively on a first portion and a second portion across an inspection visual field in the inspection visual field scanning direction in taking in a pattern image, a determination part for determining in which region, the pattern region or the non-pattern region, the first portion and the second portion are positioned, and a focus adjustment method instruction part for instructing a focus adjustment method to the focus adjustment mechanism based on the determination result of the determination part. <P>COPYRIGHT: (C)2012,JPO&INPIT |
