MICROMECHANICAL SUBSTRATE FOR A DIAPHRAGM WITH A DIFFUSION BARRIER LAYER

摘要

The invention specifies a micromechanical substrate which has at least two separate single-crystal silicon layers and which has a diaphragm in a partial region, wherein the thickness of the diaphragm is less than 20 µm and wherein the diaphragm comprises part of a first of the single-crystal silicon layers, furthermore having a heating element, which is configured to generate a temperature of more than 650°C in at least part of the diaphragm, and also having at least one diffusion barrier layer for reducing the oxidation of the first single-crystal silicon layer.