| 摘要 |
The present invention relates to a light-exposure system, and more specifically relates to a light-exposure system comprising: a light-emitting unit; a film-conveying unit wherein a film makes close contact with the surface thereof and is conveyed while being bent into a circle, an ellipse or the curvature of part thereof; and a pattern-forming unit for forming a polarisation pattern on the film by transmitting, onto the closely contacting film, the light emanating from the light-emitting unit. As a result, the light-exposure system is able to minimise film jittering and weaving even when formation of the polarisation pattern is carried out while the film, which is wound on a roller, is continuously played out, and allows uniform light exposure over a relatively wide region such that the invention is able to contribute to improved quality, notably in the patterned retarder, and increased production efficiency. |
