发明名称 |
METHOD FOR FORMING NANOSTRUCTURE FOR IMPLEMENTING HIGHLY TRANSPARENT AND SUPER WATER-REPELLENT SURFACE |
摘要 |
The present invention relates to a method for forming a nanostructure for implementing a highly transparent and super water-repellent surface, and more specifically, to a method for forming a highly transparent and super water-repellent nanostructured surface, comprising the following steps: forming island-shaped fine metal particles on the surface of a substrate; etching the surface of the substrate using the island-shaped metal fine particles as a protective mask; and removing the metal fine particles remaining on the surface of the etched substrate. According to the formation method of a nanostructure of the present invention, it is easy to form a random fine uneven surface on the surface of a substrate even without using an expensive inefficient method such as lithography, and thus to produce a highly transparent and super water-repellent surface on which a nanostructure is formed, at a low cost and with high efficiency. |
申请公布号 |
WO2012044054(A2) |
申请公布日期 |
2012.04.05 |
申请号 |
WO2011KR07132 |
申请日期 |
2011.09.28 |
申请人 |
VACOS CO., LTD.;KIM, YOUN TAEG;YANG, SOON SUK;CHO, SANG MOO;KIM, BYUNG CHAN |
发明人 |
KIM, YOUN TAEG;YANG, SOON SUK;CHO, SANG MOO;KIM, BYUNG CHAN |
分类号 |
G02B1/11;B82B3/00;C09D127/12;C23C14/24 |
主分类号 |
G02B1/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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