Dual tone photoresist formulations comprising a photoacid generator are described and employed in fabrication techniques, including methods of making structures on substrates, and more particularly, methods of making electronic devices (e.g. transistors and the like) on flexible substrates wherein two patterns are formed simultaneously in one layer of photoresist.
申请公布号
WO2011133680(A3)
申请公布日期
2012.04.05
申请号
WO2011US33266
申请日期
2011.04.20
申请人
BOARD OF REGENTS THE UNIVERSITY OF TEXAS SYSTEM;WILLSON, C., GRANT;JEN, WEI-LUN, KANE;RAWLINGS, BRANDON, MARK;STRAHAN, JEFFREY, RYAN
发明人
WILLSON, C., GRANT;JEN, WEI-LUN, KANE;RAWLINGS, BRANDON, MARK;STRAHAN, JEFFREY, RYAN