| 摘要 |
<P>PROBLEM TO BE SOLVED: To solve the following problem: a resist composition containing the conventional acid generator does not necessarily satisfy demands for a focus margin (DOF) in a pattern obtained from the composition. <P>SOLUTION: There is provided a salt expressed by formula (I). In formula (I), R<SP POS="POST">1</SP>and R<SP POS="POST">2</SP>each independently represent a fluorine atom or a 1-6C perfluoroalkyl group; L<SP POS="POST">1</SP>represents a single bond or a divalent 1-17C saturated hydrocarbon group, in which a hydrogen atom included in the divalent saturated hydrocarbon group may be replaced with a fluorine atom, and a methylene group constituting the divalent saturated hydrocarbon group may be replaced with an oxygen atom or a carbonyl group; Y represents a 1-18C aliphatic hydrocarbon group or a 3-18C alicyclic hydrocarbon group which may have a substituent, in which a methylene group constituting the aliphatic hydrocarbon group or the alicyclic hydrocarbon group may be replaced with an oxygen atom, a sulfonyl group or a carbonyl group; and Z<SP POS="POST">1+</SP>represents an organic cation having a thiophene ring. <P>COPYRIGHT: (C)2012,JPO&INPIT |
