发明名称 Halbleitervorrichtung mit Schaltelement und Freilaufdiode, sowie Steuerverfahren hierfür
摘要 A semiconductor device includes a switching element having: a drift layer; a base region; an element-side first impurity region in the base region; an element-side gate electrode sandwiched between the first impurity region and the drift layer; a second impurity region contacting the drift layer; an element-side first electrode coupled with the element-side first impurity region and the base region; and an element-side second electrode coupled with the second impurity region, and a FWD having: a first conductive layer; a second conductive layer; a diode-side first electrode coupled to the second conductive layer; a diode-side second electrode coupled to the first conductive layer; a diode-side first impurity region in the second conductive layer; and a diode-side gate electrode in the second conductive layer sandwiched between first impurity region and the first conductive layer and having a first gate electrode as an excess carrier injection suppression gate.
申请公布号 DE102011079747(A8) 申请公布日期 2012.04.05
申请号 DE20111079747 申请日期 2011.07.25
申请人 DENSO CORPORATION 发明人 SAIKAKU, HIROTAKA;YAMAMOTO, TSUYOSHI;SUMITOMO, MASAKIYO;FUJII, TETSUO;SAKAKIBARA, JUN;YAMAGUCHI, HITOSHI;HATTORI, YOSHIYUKI;TAGUCHI, RIE;MIZUNO, SHOJI;KUWAHARA, MAKOTO
分类号 H01L27/06;H01L25/18;H01L29/739;H01L29/78;H01L29/861 主分类号 H01L27/06
代理机构 代理人
主权项
地址