RADIO-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD

摘要

The purpose of the present invention is to provide a radio-sensitive resin composition for use in resist film forming that also sufficiently satisfies not only basic properties such as sensitivity, but also MEEF performance, focal depth, LRW and CDU. The present invention is a radio-sensitive resin composition for use in resist film forming according to a pattern forming method having: (1) a resist film forming step of forming a resist film on a substrate; (2) a light exposure step of exposing the resist to light; (3) a heating step of heating the light exposed resist film at a temperature not to exceed 110°C; and (4) an exposure step of exposing the heated resist film. The radio-sensitive resin composition is characterized in that it [A] contains a polymer having a structural unit (I) shown in formula (1) below and a structural unit (II) shown in formula (2) below.