| 摘要 |
<p>Disclosed is a method of producing a synthetic quartz glass for excimer laser by depositing on a target silica particulates obtained by subjecting a silica raw material to vapor-phase hydrolysis or oxidative decomposition in an oxyhydrogen flame in a vacuum sintering furnace to form a porous silica base material, vitrifying the porous silica base material, and subjecting the vitrified material to hot forming, an annealing treatment and a hydrogen doping treatment, wherein the vitrification of the porous silica base material includes: (a) a step of holding a vacuum pressure at or below 20.0 Pa in a temperature range from 400°C, inclusive, to 900°C, exclusive; (b) a step of holding a vacuum pressure at or below 10.0 Pa in a temperature range from 900°C, inclusive, to 1100°C, exclusive; and (c) a step of holding a vacuum pressure at or below 3.0 Pa in a temperature range from 1100°C to a transparent-vitrification temperature.
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