发明名称 HIGH PURITY Ta SHEET AND MANUFACTURING METHOD OF THE SAME
摘要 <p>PURPOSE: A high-purity tantalum sheet and a manufacturing method thereof are provided to reduce the standard deviation of crystal grains by identifying re-crystallization starting times of the crystal grains. CONSTITUTION: A manufacturing method of a high-purity tantalum sheet is as follows. Tantalum ingot or billet is cold-forged and is re-crystallized by annealing. A recovery annealing process is performed with a less than re-crystallization temperature in order to eliminate residual stress. The casted tantalum ingot or billet is finally cold-rolled and is re-crystallized by annealing. The recovery annealing is performed for 20 to 40 minutes.</p>
申请公布号 KR101133029(B1) 申请公布日期 2012.04.04
申请号 KR20090062635 申请日期 2009.07.09
申请人 发明人
分类号 C22B34/24;C22F1/18 主分类号 C22B34/24
代理机构 代理人
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