| 摘要 |
<p>PURPOSE: A plasma etching processing apparatus and an electrode plate are provided to form different types of vents on the electrode plate, thereby optimizing vent arrangements. CONSTITUTION: A plurality of vents is formed on a plurality of different circumferences. The circumference has a concentric circle shape. The vent vertically penetrates one surface of an electrode plate(160). The vents of different types are formed on each region in which the electrode plate is divided into two or more regions in a diameter direction. A bent type vent is included in the vents of the different types.</p> |
