MULTILAYER PHOTORESIST SYSTEMS

摘要

PURPOSE: A multi-layered photoresist system is provided to prevent or suppress the occurrence of reflection and to improve the etching resistance of an organic coating layer composition with respect to a plasma etching solution. CONSTITUTION: A multi-layered photoresist system contains an organic coating layer composition layer. The organic coating layer composition layer is under a silicon-containing photoresist layer. The organic coating layer composition layer contains aromatic and/or alicyclic group containing component and one or more coloring group containing component. A photoresist composition layer contains a photo-active component and a silicon-containing component and is arranged on the organic coating layer composition layer.