| 摘要 |
PURPOSE: A manufacturing method for alpha-SiAION phosphor is provided to manufacture nitride phosphor capable of controlling the shape and the size of particles and surface defects by low energy crushing after the synthesis of the α-SiAlON. CONSTITUTION: A manufacturing method for α-SiAION phosphor of the following chemical formula: M1xM2ySi(12-m-n)Al(m+n)OnN(16-n) comprises: a step of preparing starting material comprising silicon nitride, aluminum nitrude, and metal compounds of M1 and M2; a step of mixing 5-10 weight% of non-metal fluoride or non-metal chloride into the starting material; and a step of sintering the mixture tosynthesize α-SiAION by sintering the mixture. In the chemical formula, M1 is one or more selected from Li, Mg, Ca and Y, M2 is selected from Ce, Pr, Eu, Tb, Yb and Er, and 1.0<=m<=2.5, m=2n, 0.02<=y<=0.15, m=2x+3y.
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