| 摘要 |
An exposure apparatus is configured to expose a pattern of an original on a substrate by using light from a light source. The exposure apparatus includes an illumination optical system configured to illuminate the original by polarized light by using the light from the light source, and a correction unit configured to correct misalignment of the optical axis of the light from the light source and the optical axis of the illumination optical system. The correction unit includes a first lens and a deflecting member, the first lens can move in a direction perpendicular to an optical axis of the lens, and a deflecting direction of the light deflected by the deflecting member is variable.
|
