发明名称 |
Polishing pad and manufacturing method thereof |
摘要 |
A method for manufacturing a polishing pad made from a polyurethane resin foam having very uniform, fine cells therein and a polishing pad obtained by that method provides a polishing pad having better polishing characteristics (especially, in planarization) while providing improved dressability while maintaining the planarization characteristics and polishing speed of a conventional polishing pad. The polyurethane resin foam is a cured product obtained by reacting an isocyanate-terminated prepolymer with an aromatic polyamine chain extender having a melting point of 70° C. or lower, for example.
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申请公布号 |
US8148441(B2) |
申请公布日期 |
2012.04.03 |
申请号 |
US20060794284 |
申请日期 |
2006.02.27 |
申请人 |
DOURA MASATO;FUKUDA TAKESHI;OGAWA KAZUYUKI;KAZUNO ATSUSHI;SEYANAGI HIROSHI;NAKAMORI MASAHIKO;YAMADA TAKATOSHI;SHIMOMURA TETSUO;TOYO TIRE & RUBBER CO., LTD. |
发明人 |
DOURA MASATO;FUKUDA TAKESHI;OGAWA KAZUYUKI;KAZUNO ATSUSHI;SEYANAGI HIROSHI;NAKAMORI MASAHIKO;YAMADA TAKATOSHI;SHIMOMURA TETSUO |
分类号 |
C08G18/10;B24B37/24 |
主分类号 |
C08G18/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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