发明名称 |
Device and method for large area lithography |
摘要 |
Apparatus and method for transferring a pattern from a template (10) having a structured surface to a substrate (12) carrying a surface layer of a radiation polymerisable fluid (14). The apparatus comprises a first main part (101) and a second main part (102) having opposing surfaces (104; 105), means for adjusting a spacing (115) between said main parts, support means (106) for supporting said template and substrate in mutual parallel engagement in said spacing with said structured surface facing said surface layer, a radiation source (110) devised to emit radiation into said spacing. A cavity (115) has a first wall comprising a flexible membrane (113) devised to engage said template or substrate, and means (114; 116) are provided for applying an adjustable overpressure to a medium present in said cavity, whereby an even distribution of force is obtained over the whole of the contact surface between the substrate and the template. |
申请公布号 |
US8147235(B2) |
申请公布日期 |
2012.04.03 |
申请号 |
US20040581497 |
申请日期 |
2004.11.03 |
申请人 |
HEIDARI BABAK;BECK MARC;RIDDARGRIP BECK, LEGAL REPRESENTATIVE HELENA ELEONORA BENEDIHTA;OBDUCAT AB |
发明人 |
HEIDARI BABAK;BECK MARC;RIDDARGRIP BECK, LEGAL REPRESENTATIVE HELENA ELEONORA BENEDIHTA |
分类号 |
A01J21/00;G03F7/00;G03F7/20;H05K3/00;H05K3/10 |
主分类号 |
A01J21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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