发明名称 Thick oxide P-gate NMOS capacitor for use in a low-pass filter of a circuit and method of making same
摘要 A circuit with dielectric thicknesses is presented that includes a low-pass filter including one or more semiconductor devices having a thick gate oxide layer, while further semiconductor devices of the circuit have thin gate oxide layers. The low-pass filter semiconductor device includes an N-type substrate, a P-type region formed on the N-type substrate, a thick gate oxide layer formed over the P-type region, a P+ gate electrode formed over the thick gate oxide layer and coupled to a first voltage supply line, and P+ pick-up terminals formed in the P-type region adjacent the gate electrode and coupled to a second voltage supply line. The low-pass filter semiconductor device acts as a capacitor, whereby a gate-to-substrate voltage is maintained at less than zero volts to maintain a stable control voltage for the circuit.
申请公布号 US8148219(B2) 申请公布日期 2012.04.03
申请号 US20090484652 申请日期 2009.06.15
申请人 TAM DEREK;CHENG JASMINE;SONG JUNGWOO;HAYASHI TAKAYUKI;BROADCOM CORPORATION 发明人 TAM DEREK;CHENG JASMINE;SONG JUNGWOO;HAYASHI TAKAYUKI
分类号 H01L21/338;H01L29/94;H03L7/089;H03L7/093;H03L7/18 主分类号 H01L21/338
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