发明名称 |
CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD |
摘要 |
PURPOSE: A charged particle beam writing device and a charged particle beam writing method are provided to write a pattern with a precise dimension by suppressing the dimension variation of the pattern due to resist heating. CONSTITUTION: A TD total charge calculating unit(58) calculates a total charge amount of charged particle beams in a minimum deflection area. A TD representative temperature producing unit(62) produces a representative temperature of the minimum deflection area. An irradiation quantity modulating unit(66) modulates an irradiation quantity of the minimum deflection area by inputting the irradiation quantity of the minimum deflection area and using the representative temperature of the minimum deflection area. A writing unit(150) writes a pattern in the minimum deflection area with the modulated irradiation quantity by using a deflector(212). |
申请公布号 |
KR20120031136(A) |
申请公布日期 |
2012.03.30 |
申请号 |
KR20110094690 |
申请日期 |
2011.09.20 |
申请人 |
NUFLARE TECHNOLOGY INC. |
发明人 |
NAKAYAMADA NORIAKI;HIRAMOTO MAKOTO;YASHIMA JUN |
分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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