| 摘要 |
PURPOSE: A polymeric composition, a photo-sensitive layer using the composition, permanent patterns, a water-level lens, a solid-state imaging device, and a pattern forming method are provided to suppress the generation of development scum in a pattern forming process with respect to the surface of copper. CONSTITUTION: A polymeric composition includes a polymerization initiator, a polymeric compound, either a tungsten compound or metal boride, and alkali soluble binder. The polymerization initiator is acetophenone-based compounds or acylphosphine-based compounds. The polymeric composition further includes one compound selected from a group including thioxanthone-based compounds, acridone-based compounds, and coumarin-based compounds. The alkali soluble binder includes an acidic group or a cross-linking group. The alkali soluble binder is a (meta)acryl resin or a urethane resin. The tungsten compound is represented by general formula I. In general formula, the M is metal; the W is tungsten; and O is oxygen; the x over the y is between 0.001 and 1.1 inclusive; and the z over the y is between 2.2 and 3.0 inclusive. |
