A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要
<p>A lithographic apparatus having a first outlet to provide a thermally conditioned fluidwith a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.[Fig. 1]</p>
申请公布号
SG178675(A1)
申请公布日期
2012.03.29
申请号
SG20110057411
申请日期
2011.08.10
申请人
ASML NETHERLANDS B.V.
发明人
WESTERLAKEN, JAN, STEVEN, CHRISTIAAN;VAN DER PASCH, ENGELBERTUS, ANTONIUS, FRANSISCUS;STEIJAERT, PETER, PAUL;VAN DE MAST, FRANCISCUS;JANSSEN, GERARDUS, ARNOLDUS, HENDRICUS, FRANCISCUS
