发明名称 STAMPER FOR IMPRINTING, AND IMPRINT METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a durable stamper that follows a locally projection of a substrate to be transferred, reduces a pattern-transfer poor region, and also to provide a transferring method. <P>SOLUTION: A stamper for imprinting having an unevenness shape formed on a surface thereof includes: a pattern layer on which the unevenness shape is formed and which is made of resin; a buffer layer which is arranged on a back surface of the pattern layer and is made of resin; and a base material layer which is arranged on the back surface of the buffer layer. The Young's modulus of the buffer layer is smaller than that of the pattern layer, and the Young's modulus of the base material layer is larger than that of the buffer layer. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012061861(A) 申请公布日期 2012.03.29
申请号 JP20110241831 申请日期 2011.11.04
申请人 HITACHI LTD 发明人 SASAKI YOSHIO;ANDO TAKUJI;OGINO MASAHIKO;MIYAUCHI AKIHIRO
分类号 B29C59/02;B29C33/38;H01L21/027 主分类号 B29C59/02
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