发明名称 Plating apparatus and plating method
摘要 [Problem] To provide a plating method and apparatus which do not require preparation of a separate treatment tank for each treatment step and therefore enable the facility to be reduced in size and, further, which can reduce the amounts of use of the treatment solutions. [Solution] A plating apparatus feeding a plating solution to a treatment tank in which an electrode is arranged and plating a workpiece made of a metal so as to perform plating, the plating apparatus characterized by being provided with a plurality of pipes which are connected to an outer wall of the treatment tank and a switch valve which is provided able to rotate at an inner side of the outer wall and which has at least one feed port for making at least one treatment solution feed pipe selected from the plurality of treatment solution feed pipes communicate with the treatment tank.
申请公布号 US2012073979(A1) 申请公布日期 2012.03.29
申请号 US201113136826 申请日期 2011.08.11
申请人 SHINYAMA KEIJI;UCHIDA TOMOYA;DENSO CORPORATION 发明人 SHINYAMA KEIJI;UCHIDA TOMOYA
分类号 C25D17/00;C25D5/34 主分类号 C25D17/00
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