| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing pad which is excellent in polishing performance, has durability over a long time, can accurately flatten/smooth a polishing object to be polished, and is formed of a multi-filament hard-twist yarn fabric. <P>SOLUTION: The polishing pad includes a laminated body of a polishing layer, an interlayer adhesive layer, a support layer and a surface plate adhesive layer, wherein the polishing layer is a fabric having mesh opening of 10-150 μm, and an aperture ratio of 5-50%, and the interlayer adhesive layer is formed of a double-sided tape containing a silicone-based adhesive as a composition. <P>COPYRIGHT: (C)2012,JPO&INPIT |
