| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or a radiation-sensitive resin composition being excellent in sensitivity, resolution, line edge roughness (LER) and dry etching resistance and capable of forming a well-shaped pattern; a resist film formed using this composition; and a pattern forming method using this composition. <P>SOLUTION: An actinic ray-sensitive or a radiation-sensitive resin composition is formed by crosslinking, through an acid decomposable crosslinking organic group, between resins containing a repeating unit (A) which is decomposed by irradiation with actinic rays or radiation to generate an acid and a repeating unit (B) which is decomposed by the action of an acid to generate an alkali soluble group, and it comprises a polymer compound (P) where the crosslinking is broken by the action of an acid. A resist film is formed using this composition and a pattern forming method uses this composition. <P>COPYRIGHT: (C)2012,JPO&INPIT |
