PLASMA PROCESSING APPARATUS, DEPOSITION METHOD, METHOD OF MANUFACTURING METAL PLATE HAVING DLC FILM, AND METHOD OF MANUFACTURING SEPARATOR

摘要

PROBLEM TO BE SOLVED: To provide a plasma processing apparatus for obtaining high reproducibility in deposition processing by stabilizing plasma discharge conditions over a long time.

SOLUTION: There is provided a plasma CVD apparatus for depositing a film on a surface of a material to be treated 11. The apparatus includes: an anode made of a metal sheet 20 arranged around the material to be treated 11 as a cathode held by a holder 12; a roller 21 in which the metal sheet 20 is previously wound; and a roller 22 for winding the metal sheet 20 spread out from the roller 21.

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