| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a holding pad which can hold a polishing workpiece flat for a long period of time. <P>SOLUTION: The holding pad 10 includes a polyurethane resin foam sheet 2 having a foam structure with a plurality of foams 3 and many micropores 6 continuously formed therein by a wet film-forming method. The many micropores 6 are formed smaller than the foams 3. In the foam structure formed in the foam sheet 2, there is a reinforcing resin 5 in the many micropores 6 such that the reinforcing resin 5 accounts for 30% or more of the micropores 6 by volume. The reinforcing resin 5 is formed by impregnating the foam sheet 2 with a resin emulsion. The reinforcing resin 5 reinforces the foam structure of the foam sheet 2. <P>COPYRIGHT: (C)2012,JPO&INPIT |
