发明名称 |
SEMICONDUCTOR STRUCTURE AND METHOD FOR MAKING SAME |
摘要 |
One or more embodiments relate to a method of forming a semiconductor structure, comprising: providing a workpiece; forming a barrier layer over the workpiece; forming a seed layer over the barrier layer; forming an inhibitor layer over the seed layer; removing a portion of said inhibitor layer to expose a portion of the seed layer; and selectively depositing a fill layer on the exposed seed layer.
|
申请公布号 |
US2012074574(A1) |
申请公布日期 |
2012.03.29 |
申请号 |
US20100893009 |
申请日期 |
2010.09.29 |
申请人 |
BARTH HANS-JOACHIM;BEER GOTTFRIED;PLAGMANN JOERN;POHL JENS;ROBL WERNER;STEINER RAINER;VAUPEL MATHIAS |
发明人 |
BARTH HANS-JOACHIM;BEER GOTTFRIED;PLAGMANN JOERN;POHL JENS;ROBL WERNER;STEINER RAINER;VAUPEL MATHIAS |
分类号 |
H01L21/768;H01L23/532 |
主分类号 |
H01L21/768 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|