THIN-FILM SEMICONDUCTOR CRYSTALLINITY EVALUATION APPARATUS, USING ?-PCD METHOD

摘要

In a crystallinity evaluation apparatus (1) and a crystallinity evaluation method for thin-film semiconductors, of the present invention, excitation light and an electromagnetic wave are radiated upon a measuring portion of a sample (2) of a thin-film semiconductor (2a), and crystallinity of the sample (2) is evaluated by detecting the intensity of the reflection electromagnetic wave from the sample (2). The thin-film semiconductor (2a) of the sample (2) is formed upon a conductive film (2b), and further, a dielectric (3) that shows permeability to excitation light is arranged between the sample (2) and a waveguide (13) from which the electromagnetic wave is to be radiated. With a thin-film semiconductor crystallinity evaluation apparatus (1) and a method therefor that are configured in such a way, crystallinity can be evaluated even when a conductive film (2b) is formed under the thin-film semiconductor (2a), as mentioned above.