| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a photoelectric conversion device having high conversion efficiency in which occurrence of surface plasmon absorption is reduced in a back electrode layer. <P>SOLUTION: In the method of manufacturing a photoelectric conversion device 100 where a first transparent electrode layer 2, a photoelectric conversion layer 3, a second transparent electrode layer 5, and a back electrode layer 4 consisting of a metal film are laminated sequentially on a substrate 1, the second transparent electrode layer 5 is formed by sputtering in a film deposition chamber where the partial water vapor pressure is controlled below 0.6%. <P>COPYRIGHT: (C)2012,JPO&INPIT |
