| 摘要 |
<P>PROBLEM TO BE SOLVED: To suppress nonuniformity of a pattern formed on a substrate while maintaining an exposure amount within a predetermined range. <P>SOLUTION: A pattern formation method forms a pattern on a photosensitive substrate by irradiating the substrate with exposure light from a projection optical system through a mask pattern with a line part and a space part. The pattern formation method comprises the steps of: determining whether or not an integrated exposure amount in a projection area of the projection optical system necessary for forming the pattern on the substrate is within a predetermined range; changing the mask pattern to another mask pattern having the same pitch of the line part and the space part as the mask pattern, and the different line width ratio of the line part and the space part from the mask pattern when the integrated exposure amount is not within the predetermined range; deciding an exposing condition and a development condition by using the another mask pattern; exposing the substrate with the exposure light irradiating the projection area on the exposing condition; and developing the substrate on the development condition. <P>COPYRIGHT: (C)2012,JPO&INPIT |
