发明名称 PROCESSING SYSTEMS AND APPARATUSES HAVING A SHAFT COVER
摘要 Apparatus and systems are disclosed for processing a substrate. In an embodiment, a system includes a processing chamber, which includes a substrate support to support the substrate. The chamber further includes a plate member positioned below the substrate support and designed to improve heating efficiency within the processing chamber. The processing chamber further includes a lower dome positioned below the plate member. The plate member is designed to prevent a coating from being deposited on the lower dome during processing conditions. The plate member is designed to prevent particles and debris from falling below the plate member. The plate member is designed to improve heating uniformity between the plate member and the substrate within the processing chamber.
申请公布号 WO2012040505(A2) 申请公布日期 2012.03.29
申请号 WO2011US52823 申请日期 2011.09.22
申请人 APPLIED MATERIALS, INC.;HUANG, JUNO YU-TING;KANG, SANG, WON;QUACH, DAVID, H.;HSU, WEI-YUNG 发明人 HUANG, JUNO YU-TING;KANG, SANG, WON;QUACH, DAVID, H.;HSU, WEI-YUNG
分类号 H01L21/205;H01L21/20 主分类号 H01L21/205
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