发明名称 |
SURFACE-TREATING AGENT FOR PATTERN FORMATION AND PATTERN-FORMING METHOD USING THE SURFACE-TREATING AGENT |
摘要 |
A surface-treating agent for forming a resist pattern, includes: a compound represented by formula (1) as defined in the specification, wherein the surface-treating agent is used in a step between a formation of a first resist pattern on a first resist film and a formation of a second resist film on the first resist pattern to form a second resist pattern, and a pattern-forming method uses the surface-treating agent. |
申请公布号 |
US2012076991(A1) |
申请公布日期 |
2012.03.29 |
申请号 |
US201113307813 |
申请日期 |
2011.11.30 |
申请人 |
HOSHINO WATARU;TSUBAKI HIDEAKI;YOSHIDOME MASAHIRO;FUJIFILM CORPORATION |
发明人 |
HOSHINO WATARU;TSUBAKI HIDEAKI;YOSHIDOME MASAHIRO |
分类号 |
B32B3/00;G03F7/20 |
主分类号 |
B32B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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