AMORPHOUS MULTI-COMPONENT METALLIC THIN FILM NANOLAMINATES

摘要

An electronic structure comprising: (a) a first metal layer; (b) a second metal layer; (c) and at least one insulator layer located between the first metal layer and the second metal layer, wherein at least one of the metal layers comprises an amorphous multi-component metallic film. In certain embodiments, the construct is a metal-insulator-metal (MIM) diode. In other embodiments, the construct is a amorphous multi-component metallic thin film nanolaminate.