发明名称 RADIATION-SENSITIVE RESIN COMPOSITION, INTERLAYER INSULATING FILM, FORMATION METHOD OF INTERLAYER INSULATING FILM, AND DISPLAY ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition excellent in sensitivity and resolution, and an interlayer insulating film excellent in transparency, adhesion in development, relative permittivity, or the like, with reduced unevenness. <P>SOLUTION: A radiation-sensitive resin composition contains a copolymer [A], a polymerizable unsaturated compound [B], radiation-sensitive polymerization initiator [C], and an organic solvent [D]. The copolymer [A] contains a structural unit (A1), a structural unit (A2), a structural unit (A3), and a structural unit (A4). In the copolymer [A], the structural unit (A1) has a content ratio of 1 mol% to 40 mol%, the structural unit (A2) has a content ratio of 1 mol% to 15 mol%, the structural unit (A3) has a content ratio of 1 mol% to 70 mol%, and the structural unit (A4) has a content ratio of 1 mol% to 30 mol%. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012063626(A) 申请公布日期 2012.03.29
申请号 JP20100208495 申请日期 2010.09.16
申请人 JSR CORP 发明人 ICHINOHE DAIGO;YASHIRO TAKAO
分类号 G03F7/033;C08F2/44;C08F212/04;C08F220/04;C08F220/10;C08F257/00;G03F7/004;G03F7/027;G03F7/40;H01L21/027 主分类号 G03F7/033
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