| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device inspection method and an exposure device, capable of obtaining a highly accurate inspection result by forming a highly accurate transfer pattern and by acquiring diffraction light detection data, when inspecting the exposure device using a photo mask. <P>SOLUTION: The exposure device inspection method comprises illuminating, from a direction inclining relative to an optical axis, a photo mask 112 having a first pattern group 201 including a plurality of stripe-shaped patterns arrayed at a first pitch and having pattern widths different from patterns placed between both ends thereof, and a second pattern group 202 including a plurality of stripe-shaped patterns arrayed at a second pitch, to cause the first and the second pattern groups to generate first diffraction light and second diffraction light. The exposure device inspection method further comprises: forming a first image by the first diffraction light and a second image by the second diffraction light on the wafer; measuring a relative distance between the first image and the second image; and inspecting a state of a projection optical system in the exposure device based on the relative distance. <P>COPYRIGHT: (C)2012,JPO&INPIT |
