发明名称 |
PHOTOREACTIVE POLYMER AND ALIGNMENT LAYER COMPRISING THE SAME |
摘要 |
Disclosed therein are a photoreactive polymer, and an alignment layer comprising the same that exhibit excellences in alignment rate and alignment stability. The photoreactive polymer comprises a cyclic olefin-based repeating unit with at least one photoreactive substituent, and the maximum absolute value of a variation in dichloric ratio per unit UV dose as given by d(dichloric ratio)/d(mJ/cm2) upon exposure to a polarized UV radiation having a wavelength of 150 to 450 nm at a total exposure dose of 20 mJ/cm2 or less is at least 0.003.
|
申请公布号 |
US2012075560(A1) |
申请公布日期 |
2012.03.29 |
申请号 |
US201113244104 |
申请日期 |
2011.09.23 |
申请人 |
YOO DONG-WOO;CHUN SUNG-HO;CHOI DAI-SEUNG;LG CHEM, LTD. |
发明人 |
YOO DONG-WOO;CHUN SUNG-HO;CHOI DAI-SEUNG |
分类号 |
G02F1/1337;C08F132/08 |
主分类号 |
G02F1/1337 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|