| 发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a system that reduces lithography errors arising from an immersion liquid. <P>SOLUTION: A lithographic apparatus includes: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device capable of imparting a pattern to the radiation beam in its cross section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; a liquid supply system configured to at least partly fill a space between a final element of the projection system and the substrate with a liquid; a seal member arranged to substantially contain the liquid within the space between the final element of the projection system and the substrate; and elements to control and/or compensate for evaporation of the immersion liquid from the substrate. <P>COPYRIGHT: (C)2012,JPO&INPIT |
| 申请公布号 |
JP2012064982(A) |
申请公布日期 |
2012.03.29 |
| 申请号 |
JP20110285516 |
申请日期 |
2011.12.27 |
| 申请人 |
ASML NETHERLANDS BV |
发明人 |
CADEE THEODORUS PETRUS MARIA;JACOBS JOHANNES HENRICUS WILHELMUS;KATE NICOLAAS TEN;LOOPSTRA ERIK ROELOF;ASHWIN RODEVICK HENDRICKS JOHANNES VAN MEHL;JEROEN JOHANNES SOPHIA MARIA MERTENS;CHRISTIANUS GERARDUS MARIA DE MOL;MUITJENS MARCEL JOHANNUS ELISABETH HUBERTUS;VAN DER NET ANTONIUS J;OTTENS JOOST JEROEN;QUAEDACKERS JOHANNES ANNA;REUHMAN-HUISKEN MARIA ELISABETH;MARCO COELHO STAUFEN;TINNEMANS PATRICIUS ALOYSIUS J;VERHAGEN MARTINUS CORNELIS MARIA;VERSPAIJ JACOBUS JOHANNUS LEONARDUS HENDRICUS;DE JONG FREDERIK EDUARD;GOORMAN KOEN;MENCHTCHIKOV BORIS;BOOM HERMAN;STOYAN NIHTIANOV;MOERMAN RICHARD;SMEETS MARTIN FRANS PIERRE;SCHOONDERMARK BART LEONARD PETER;JANSSEN FRANCISCUS JOHANNES JOSEPH;RIEPEN MICHEL |
| 分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
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