发明名称 PLASMA REACTOR HAVING MULTI POWER SUPPLY FOR TOP AND BOTTOM MULTI DIVIDED ELECTRODE
摘要 PURPOSE: A plasma reactor having multi power source for a top and bottom multi split electrode is provided to control the feedback of power offered to a multiple split electrode by using an electrical characteristic value of the power offered from a multiple power source. CONSTITUTION: A discharge space of plasma is formed in a plasma chamber(110). A first multiple split electrode set(120) has a plurality of first unity split electrodes in the plasma chamber. A second multiple split electrode set(140) has a plurality of second unity split electrodes for inducing the plasma which is capacitively coupled with the first multiple split electrode set. A multiple power source has a plurality of power sources for offering the power to the first and the second multiple split electrode set. An electrical characteristic value detection unit(155) measures the electrical characteristic value of the power. A controller(160) controls the feedback of the power provided from the multiple power source based on the electrical characteristic value.
申请公布号 KR20120030721(A) 申请公布日期 2012.03.29
申请号 KR20100092412 申请日期 2010.09.20
申请人 NEW POWER PLASMA CO., LTD. 发明人 CHOI, DAI KYU
分类号 H05H1/24;H05H1/34 主分类号 H05H1/24
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