| 摘要 |
<p>PURPOSE: A cleaning unit of a carrier head of a chemical mechanical polishing apparatus and a transportable chemical mechanical polishing system using the same are provided to secure fixed polishing quality by eliminating slurry and polishing particles which are inserted in the edge of a retainer ring. CONSTITUTION: A plurality of nozzles(193) is fixed to a nozzle carrier(192). A plurality of nozzles sprays washing solution upward. The nozzle carrier is rotatively installed. A recovery container(191) collects the washing solution which falls after washing a carrier head. A discharging path discharges the washing solution which is collected to the recovery container. A housing is extended from the recovery container. A turning motor rotates the housing in a site opposite to the recovery container. A loading unit installs the substrate in the substrate carrier unit. An unloading unit unloads the substrate which is polished in a polishing and lapping plate from the substrate carrier unit.</p> |
