| 摘要 |
A gas treatment device 1 comprises: a plasma source 10 and catalytic reaction chamber 20 for accommodation of one or more catalysts, wherein the plasma source comprises: a plasma source gas inlet 12; a plasma confinement vessel; a microwave chamber 40 which surrounds at least part of the plasma confinement vessel 15; a microwave source for supplying microwave radiation to the microwave chamber; and a plasma source outlet 17 in fluid communication with the catalytic reaction chamber by a catalytic reaction chamber aperture; wherein the catalytic reaction chamber comprises: a catalytic reaction chamber gas inlet; and a catalytic reaction chamber outlet for gas having been treated; and wherein the plasma confinement vessel is configured: (a) to receive plasma initiating gas from the plasma source gas inlet; (b) to contain gas and a plasma once initiated; and (c) so as to establish a non-resonant multimode microwave cavity in the microwave chamber and the plasma confinement vessel. A method of use of the gas treatment device is also disclosed. |
