发明名称 |
PREPARATORY PHOTORESIST DISCHARGING DEVICE FOR SUBSTRATE COATER APPARATUS AND SUBSTRATE COATING METHOD USING SAME |
摘要 |
<p>PURPOSE: A pre dispensing device of a substrate coater apparatus and a substrate coating method thereof are provided to prevent the local stress applied on a thin plate from affecting negative effect on the life time of the thin plate. CONSTITUTION: A moving unit moves a thin plate in an air floating type to locate the thin plate between a first position and a second position. The first position is a position in which the thin plate is near to or contacted with a processed substrate(G). The second position is a position out of the first position. The location in which in which the thin plate is near to the processed substrate is a position in which the thin plate is overlapped with a part of the processed substrate. The thin plate is overlapped with a part of the processed substrate in a contacted state.</p> |
申请公布号 |
KR20120029967(A) |
申请公布日期 |
2012.03.27 |
申请号 |
KR20100092118 |
申请日期 |
2010.09.17 |
申请人 |
K.C.TECH CO., LTD. |
发明人 |
KWEON, YOUNG KYU;JU, JONG KYU |
分类号 |
G02F1/13;H01L21/027 |
主分类号 |
G02F1/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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