发明名称 PREPARATORY PHOTORESIST DISCHARGING DEVICE FOR SUBSTRATE COATER APPARATUS AND SUBSTRATE COATING METHOD USING SAME
摘要 <p>PURPOSE: A pre dispensing device of a substrate coater apparatus and a substrate coating method thereof are provided to prevent the local stress applied on a thin plate from affecting negative effect on the life time of the thin plate. CONSTITUTION: A moving unit moves a thin plate in an air floating type to locate the thin plate between a first position and a second position. The first position is a position in which the thin plate is near to or contacted with a processed substrate(G). The second position is a position out of the first position. The location in which in which the thin plate is near to the processed substrate is a position in which the thin plate is overlapped with a part of the processed substrate. The thin plate is overlapped with a part of the processed substrate in a contacted state.</p>
申请公布号 KR20120029967(A) 申请公布日期 2012.03.27
申请号 KR20100092118 申请日期 2010.09.17
申请人 K.C.TECH CO., LTD. 发明人 KWEON, YOUNG KYU;JU, JONG KYU
分类号 G02F1/13;H01L21/027 主分类号 G02F1/13
代理机构 代理人
主权项
地址