发明名称 METHOD FOR OBTAINING SPUTTERING TARGET FROM ALUMINIUM-BASED ALLOY
摘要 FIELD: metallurgy. ^ SUBSTANCE: aluminium is molten, molten metal is brought to overheated homogeneous state at temperature of 1150C. Stannum, indium and bismuth is added; melt temperature is brought to temperature of up to 1150C; exposure is performed at this temperature. Then, lead and copper is added so that alloy can be obtained with the composition, wt %: lead 13.5, stannum 4.5, copper 0.5, indium 1.0, bismuth 1.3, aluminium 79.2 or with the following composition, wt %: lead 15.4, stannum 5.0, copper 1.0, indium 0.5, bismuth 1.0, aluminium 77.1 or with the following composition, wt %: lead 13.2, stannum 5.5, copper 1.4, indium 1.5, bismuth 0.5, aluminium 77.9, melt is mixed and exposed at temperature of 1150C. After that, melt is drained to spray-type melting pot and sprayed with argon till the powder that is compacted and rolled till the plate is produced is obtained, and sputtering target is made from it. ^ EFFECT: producing the target allowing to obtain thin working layers on treated items and providing improved running-in ability and scoring resistance of working layers without reducing the strength and wear resistance. ^ 1 tbl, 1 ex
申请公布号 RU2446229(C1) 申请公布日期 2012.03.27
申请号 RU20100148890 申请日期 2010.12.01
申请人 UCHREZHDENIE ROSSIJSKOJ AKADEMII NAUK INSTITUT FIZIKI TVERDOGO TELA RAN (IFTT RAN) 发明人 SHTINOV EVGENIJ DMITRIEVICH;GLEBOVSKIJ VADIM GEORGIEVICH;CHASHECHKINA ZHANNETA JUR'EVNA;ISHCHENKO VLADIMIR IVANOVICH;BYVSHEV PETR JAKOVLEVICH
分类号 C22C1/02;C22C21/00;C23C14/34 主分类号 C22C1/02
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