发明名称 |
Methodology to enable wafer result prediction of semiconductor wafer batch processing equipment |
摘要 |
A method to enable wafer result prediction from a batch processing tool, includes collecting manufacturing data from a batch of wafers processed in batch in the batch processing tool, to form a batch processing result; defining a degree of freedom of the batch processing result based on the manufacturing data; and performing an optimal curve fitting by trial and error for an optimal function model of the batch processing result based on the batch processing result.
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申请公布号 |
US8145337(B2) |
申请公布日期 |
2012.03.27 |
申请号 |
US20070941518 |
申请日期 |
2007.11.16 |
申请人 |
LIN CHUN-HSIEN;WANG AMY;KO FRANCIS;WANG JEAN;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
LIN CHUN-HSIEN;WANG AMY;KO FRANCIS;WANG JEAN |
分类号 |
G06F19/00 |
主分类号 |
G06F19/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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