THIN FILM DEPOSITION APPARATUS

摘要

PURPOSE: A thin film depositing apparatus is provided to prevent unnecessary thin film deposition in a gas entry area by supplying additional gas to the upper side of a susceptor through a susceptor support. CONSTITUTION: A susceptor support(130) supports the center of a susceptor and includes an additional gas supply unit(150). The additional gas supply unit sprays additional gas from the outside of a chamber to the upper side of the susceptor. A source gas supply unit(140) supplies a first source gas and a second source gas to the substrates on the susceptor by spraying the first source gas and the second source gas around the susceptor through source gas spray holes.