发明名称 Semiconductor device
摘要 A problem of an increased manufacturing cost is caused in conventional semiconductor devices. A semiconductor device 1 includes: a lower electrode 102 provided on a semiconductor substrate 101; an insulating film 105, provided on the lower electrode 102 so as to be in contact with the lower electrode 102; an upper electrode 103, provided on the insulating film 105 so as to be in contact with the insulating film 105; an opening portion 121, provided in the lower electrode 102 and extending through the lower electrode 102; and an opening portion 122, provided in the upper electrode 103 and extending through the upper electrode 103. The insulating film 123 is embedded in the opening portion 121 that is provided in the lower electrode 102. Similarly, the insulating film 124 is embedded in the opening portion 122 that is provided in the upper electrode 103.
申请公布号 US8143698(B2) 申请公布日期 2012.03.27
申请号 US20090535282 申请日期 2009.08.04
申请人 YOSHINAGA CHIKASHI;RENESAS ELECTRONICS CORPORATION 发明人 YOSHINAGA CHIKASHI
分类号 H01L29/92 主分类号 H01L29/92
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